ABSORPTION STUDIES AT 193 NM IN E-BEAM EXCITED XENON

被引：3

作者：

DUZY, C

BONESS, MJW

机构：

[1] Avco-Everett Research Laboratory, Inc., Everett, MA 02149

来源：

APPLIED PHYSICS LETTERS | 1979年 / 35卷 / 12期

关键词：

D O I：

10.1063/1.91017

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

This study was undertaken in order to determine whether the observed premature 172-nm laser pulse termination in pure xenon was caused by medium absorption. The absorption was measured by probing the e-beam excited xenon with an ArF (193 nm) laser. Analysis of the results indicates that premature pulse termination cannot be explained entirely by the observed medium absorption.

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页码：903 / 905

页数：3

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