RAPID ISOTHERMAL PROCESSING

被引：175

作者：

SINGH, R

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 63卷 / 08期

关键词：

D O I：

10.1063/1.340176

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：R59 / R114

页数：56

共 539 条

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