MEASUREMENT OF UNIFORMITY OF DRIVING VOLTAGE IN TI-LINBO3 WAVE-GUIDES USING MACH-ZEHNDER INTERFEROMETERS

被引：6

作者：

FUJIWARA, T

WATANABE, A

MORI, H

机构：

[1] Electronics Materials Laboratory, Sumitomo Metal Mining Company

来源：

IEEE PHOTONICS TECHNOLOGY LETTERS | 1990年 / 2卷 / 04期

关键词：

D O I：

10.1109/68.53255

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A novel method of measuring a spatial variation of electrically induced index change (electrooptic effect) in Ti-diffused LiNbO3 optical waveguides is demonstrated. The result of measurements on 45 positions on x-cut and z-cut substrates shows that the spatial variation of the half-wave voltage of the waveguide interferometers is less than ±3%. © 1990 IEEE

引用

页码：260 / 261

页数：2

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