SIMS WITH A STANDARD QUADRUPOLE RESIDUAL GAS ANALYZER

被引：9

作者：

THOMAS, GE ^{[1
]}

KLUIZENA.EE ^{[1
]}

机构：

[1] PHILIPS RES LABS,EINDHOVEN,NETHERLANDS

来源：

关键词：

D O I：

10.1063/1.1686660

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

引用

页码：457 / 458

页数：2

共 7 条

[1] TANDEM MASS SPECTROMETER FOR SECONDARY ION STUDIES
BENNINGHOVEN, A
LOEBACH, E
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1971, 42 (01) : 49 - +
[2] SURFACE INVESTIGATION OF SOLIDS BY STATICAL METHOD OF SECONDARY ION MASS SPECTROSCOPY (SIMS)
BENNINGHOVEN, A
[J]. SURFACE SCIENCE, 1973, 35 (01) : 427 - 457
[3] Dennis E., 1972, Radiation Effects, V13, P243, DOI 10.1080/00337577208231186
[4] RUDENAUER PG, 1972, VACUUM, V22, P609
[5] SIMPLE, INEXPENSIVE SIMS APPARATUS
SCHUBERT, R
TRACY, JC
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1973, 44 (04) : 487 - 491
[6] INVESTIGATION OF SURFACE-LAYERS BY SIMS AND SIIMS
WERNER, HW
DEGREFTE, HA
[J]. SURFACE SCIENCE, 1973, 35 (01) : 458 - 472
[7] Wittmaack K., 1973, International Journal of Mass Spectrometry and Ion Physics, V11, P23, DOI 10.1016/0020-7381(73)80052-X