LOW-TEMPERATURE DIAMOND DEPOSITION BY MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR-DEPOSITION

被引：83

作者：

LIOU, Y

INSPEKTOR, A

WEIMER, R

MESSIER, R

机构：

来源：

关键词：

D O I：

10.1063/1.101807

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：631 / 633

页数：3

共 12 条

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