THERMAL FORMATION OF VACANCIES IN TIAL

被引:85
作者
BROSSMANN, U
WURSCHUM, R
BADURA, K
SCHAEFER, HE
机构
[1] Institut fur Theoretische und Angewandte Physik, Universitat Stuttgart, 70569 Stuttgart
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 10期
关键词
D O I
10.1103/PhysRevB.49.6457
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The formation of thermal vacancies, which is a key issue with respect to the high-temperature properties of ordered intermetallic compounds, was studied in gamma-TiAl by means of positron lifetime spectroscopy between ambient temperature and 1400 K. An estimate of the atomic concentration of thermal vacancies yields a value similar as in pure fcc metals and an effective vacancy formation enthalpy of 1.41+/-0.06 eV in good agreement with nearest-neighbor-bond model calculations. A comparison of these data with the results of recent self-diffusion studies suggests a low mobility of vacancies as typical for ordered intermetallic compounds. No evidence for structural vacancies at ambient temperature could be observed.
引用
收藏
页码:6457 / 6461
页数:5
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