INTERACTION OF HCN (DCN) WITH SI(111)-7X7 STUDIED WITH HREELS, UPS, AND XPS

被引：28

作者：

BU, Y ^{[1
]}

MA, L ^{[1
]}

LIN, MC ^{[1
]}

机构：

[1] EMORY UNIV,DEPT CHEM,ATLANTA,GA 30322

来源：

JOURNAL OF PHYSICAL CHEMISTRY | 1993年 / 97卷 / 45期

关键词：

D O I：

10.1021/j100147a037

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The interaction of HCN (DCN) with Si(111)-7x7 was studied with high-resolution electron energy loss spectroscopy (HREELS), ultraviolet photoelectron spectroscopy (UPS), and X-ray photoelectron spectroscopy (XPS). HCN (DCN) formed dimers and/or polymers on the surface at 100 K with higher dosages (D > 4 langmuirs). Above 200 K, CN radicals in an end-on adsorption geometry were identified as the major species which survived up to 600 K on the surface. This observation was different from that with HCN (DCN) on Si(100)-2x1, where the relative concentration of the HCNH species was higher. The observed difference in the behavior of HCN (DCN) on Si(111)-7x7 and Si(100)-2x1 could be ascribed to the different topologies of the two surfaces.

引用

页码：11797 / 11801

页数：5

共 15 条

[1] USE OF MULTILAYER TECHNIQUES FOR XPS IDENTIFICATION OF VARIOUS NITROGEN ENVIRONMENTS IN THE SI/NH3 SYSTEM [J].