CURRENT STATUS AND PROBLEMS OF SR LITHOGRAPHY

被引：5

作者：

YOSHIHARA, H

机构：

[1] NTT LSI Laboratories 3-1, Atsugi-shi, Kanagawa, 243-01, Morinosato Wakamiya

来源：

MICROELECTRONIC ENGINEERING | 1992年 / 17卷 / 1-4期

关键词：

D O I：

10.1016/0167-9317(92)90025-M

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

A compact ring named Super-ALIS employing low-energy one-pulse injection and superconducting magnets achieves stable operation. The beam current is 200 mA and the lifetime is 5.5 hours. Beamlines consisting of two-mirror optics are connected to the SR ring. X-ray steppers with alignment accuracy higher than 0.07-mu-m (3-sigma) are set up in a clean room. The steppers always operate for fine pattern replication using X-ray masks having the position accuracy higher than 0.09-mu-m (3-sigma).

引用

页码：123 / 130

页数：8

共 6 条

[1]

Shibayama, Kitayama, Hayasaka, Ido, Uno, Hosokawa, Nakata, Nishimura, Nakajima, REVIEW OF SCIENTIFIC INSTRUMENTS, 60, 7, (1989)

[2]

Hosokawa, Kitayama, Hayasaka, Ido, Uno, Shibayama, Nakata, Nishimura, Nakajima, REVIEW OF SCIENTIFIC INSTRUMENTS, 60, 7, (1989)

[3]

Kaneko, Saitoh, Itabashi, Yoshihara, High efficiency beamline for synchrotron radiation lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 9 B, (1991)

[4]

Itabashi, Okada, Kaneko, Matsuo, Yoshihara, SPIE No. 1333, (1990)

[5]

Ishihara, Kanai, Une, Suzuki, A vertical stepper for synchrotron x-ray lithography, Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 7 B, 6, (1989)

[6]

Ohki, Kakuchi, Matsuda, Ozawa, Ohkubo, Oda, Yoshihara, Jpn. J. Appl. Phys., 28, 10, (1989)

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