HEAT-PULSE PROPAGATION IN P-TYPE SI AND GE UNDER UNIAXIAL STRESS

被引:22
作者
FJELDLY, T [1 ]
ISHIGURO, T [1 ]
ELBAUM, C [1 ]
机构
[1] BROWN UNIV,DEPT PHYS,PROVIDENCE,RI 02912
来源
PHYSICAL REVIEW B | 1973年 / 7卷 / 04期
关键词
D O I
10.1103/PhysRevB.7.1392
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:1392 / 1410
页数:19
相关论文
共 40 条
[1]  
Akimchenko I. P., 1969, Fizika Tverdogo Tela, V11, P658
[2]  
AKIMCHENKO IP, 1969, FIZ TVERD TELA+, V11, P528
[3]   INFLUENCE OF UNIAXIAL STRESS ON INDIRECT ABSORPTION EDGE IN SILICON AND GERMANIUM [J].
BALSLEV, I .
PHYSICAL REVIEW, 1966, 143 (02) :636-&
[4]   DIRECT EDGE PIEZO-REFLECTANCE IN GE AND GAAS [J].
BALSLEV, I .
SOLID STATE COMMUNICATIONS, 1967, 5 (04) :315-&
[5]  
Carruthers J. A., 1962, CRYOGENICS, V2, P160, DOI [10.1016/0011-2275(62)90035-8, DOI 10.1016/0011-2275(62)90035-8]
[6]   THE THERMAL CONDUCTIVITY OF GERMANIUM AND SILICON BETWEEN 2-DEGREES-K AND 300-DEGREES-K [J].
CARRUTHERS, JA ;
GEBALLE, TH ;
ROSENBERG, HM ;
ZIMAN, JM .
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1957, 238 (1215) :502-514
[7]  
Fedorov F.I., 2013, THEORY ELASTIC WAVES
[8]  
FJELDLY TA, 1972, THESIS BROWN U
[9]  
GERSTEIN I, UNPUBLISHED
[10]   EFFECT OF STRAIN ON EXCITON SPECTRUM OF GERMANIUM [J].
GLASS, AM .
CANADIAN JOURNAL OF PHYSICS, 1965, 43 (01) :12-&