EVOLUTION OF SURFACE-ROUGHNESS ON THE ATOMIC LEVEL DURING THE COMPUTER-SIMULATED GROWTH OF A METALLIC FILM CONDENSED IN VACUUM

被引：10

作者：

CHAUVINEAU, JP

机构：

来源：

JOURNAL OF CRYSTAL GROWTH | 1981年 / 53卷 / 03期

关键词：

D O I：

10.1016/0022-0248(81)90131-7

中图分类号：

O7 [晶体学];

学科分类号：

0702 ; 070205 ; 0703 ; 080501 ;

摘要：

引用

页码：505 / 514

页数：10

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[8] INFLUENCE OF METAL ADSORPTION ON ELECTRICAL-RESISTIVITY OF THIN GOLD-FILMS [J].

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