FABRICATION OF THIN-FILM MICROCIRCUITS ON CURVED SUBSTRATES

被引：5

作者：

SEED, WA

机构：

[1] Physiological Flow Studies Unit, Department of Aeronautics Imperial College, London

来源：

JOURNAL OF PHYSICS E-SCIENTIFIC INSTRUMENTS | 1969年 / 2卷 / 02期

关键词：

D O I：

10.1088/0022-3735/2/2/425

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

A technique is described which allows accurate selective etching of thin metal films deposited on substrates with a single curvature, of radius down to 0·5 mm, for the production of resistive microcircuits.

引用

页码：206 / &