THIN-FILM DEPOSITION BY MAGNETRON SPUTTERING AND DETERMINATION OF SOME PHYSICAL PARAMETERS

被引：20

作者：

RAMOS, MMD ^{[1
]}

ALMEIDA, JB ^{[1
]}

FERREIRA, MIC ^{[1
]}

DOSSANTOS, MP ^{[1
]}

机构：

[1] UNIV MINHO,INIC,CTR QUIM PURA & APLICADA,P-4719 BRAGA,PORTUGAL

来源：

THIN SOLID FILMS | 1989年 / 176卷 / 02期

关键词：

D O I：

10.1016/0040-6090(89)90095-3

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：219 / 226

页数：8

共 17 条

[1]

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[2]

BUBE RH, 1981, ELECTRONS SOLIDS

[3] SOME PHYSICAL-PROPERTIES OF ZNO SPUTTERED FILMS [J].

CROITORU, N ;

SEIDMAN, A ;

YASSIN, K .

THIN SOLID FILMS, 1987, 150 (2-3) :291-301

[4] PROPERTIES OF ELECTRON-BEAM-EVAPORATED TIN OXIDE-FILMS [J].

DAS, D ;

BANERJEE, R .

THIN SOLID FILMS, 1987, 147 (03) :321-331

[5]

FRANZOSI P, 1987, THIN SOLID FILMS, V150, pL67

[6]

HEAVENS O, 1970, THIN FILM PHYSICS

[7]

Hecht E., 1980, OPTICS

[8]

Jarzebski ZM, 1973, OXIDE SEMICONDUCTORS

[9] TRANSPARENT CONDUCTING OXIDES OF METALS AND ALLOYS MADE BY REACTIVE MAGNETRON SPUTTERING FROM ELEMENTAL TARGETS [J].

LEWIN, R ;

HOWSON, RP ;

BISHOP, CA ;

RIDGE, MI .

VACUUM, 1986, 36 (1-3) :95-98

[10]

Maissel L.I., 1970, HDB THIN FILM TECHNO

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