APPLICATIONS OF QUASI-STEADY MAGNETO-PLASMA-DYNAMIC ARCJETS TO CERAMIC COATINGS

被引：9

作者：

TAHARA, H ^{[1
]}

ABE, T ^{[1
]}

TSUBAKI, T ^{[1
]}

KAGAYA, Y ^{[1
]}

TSUBAKISHITA, Y ^{[1
]}

YOSHIKAWA, T ^{[1
]}

KUWATA, M ^{[1
]}

UEDA, Y ^{[1
]}

机构：

[1] MITSUBISHI HEAVY IND CO LTD,TAKASAGO RES & DEV CTR,TAKASAGO,HYOGO 676,JAPAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1993年 / 32卷 / 11A期

关键词：

MAGNETO-PLASMA-DYNAMIC ARCJET; ELECTROMAGNETIC ACCELERATION; QUASI-STEADY OPERATION; MATERIAL PROCESSING; PLASMA SPRAYING; CERAMIC COATING; HIGH PARTICLE VELOCITY; HIGH PLASMA TEMPERATURE; LARGE AREA; HIGH FILM GROWTH RATE;

D O I：

10.1143/JJAP.32.5122

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

For applications of quasi-steady magneto-plasma-dynamic (MPD) arcjets to material processing, an MPD arcjet with a cathode covered with ceramic materials was developed. In 100-shot operations at 5-10 kA, the ablation rates of the ceramic covers ranged from 2.5 to 5.0 mg/shot. The front velocities of ablated Al atoms inferred with a streak camera were much higher than velocities of 200-500 m/s for conventional plasma torches for material processing. This is effective for deposition of rigid films adhering strongly to substrate surfaces. The SEM photographs showed that a dense uniform film was deposited near the center of the substrate. From the XPS spectra, the peak area ratio of Ti/Al for the coating film almost equaled that for the cross section, and the valence numbers of Al and Ti did not change.

引用

页码：5122 / 5128

页数：7

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