RBS TECHNIQUE FOR MEASUREMENT OF THE EROSION RATE OF ION-IMPLANTED FILMS

被引：4

作者：

KIRIAKIDIS, G

CHRISTODOULIDES, CE

CARTER, G

COLLIGON, JS

机构：

[1] Department of Electrical Engineering, University of Salford, Salford

来源：

APPLIED PHYSICS | 1979年 / 19卷 / 02期

关键词：

34; 79.20;

D O I：

10.1007/BF00932396

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The glancing incidence Rutherford backscattering method is used to study the erosion of aluminium films during bombardment by 10 keV Ar+ ions. It is found that the erosion rate of the firm is about one third the value expected and also that the depth profile of previously implanted 80 ke VPb+ ions changes during the erosion. © 1979 Springer-Verlag.

引用

页码：191 / 194

页数：4

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