ELECTRODE-LIMITED TO BULK-LIMITED CONDUCTION IN SILICON OXIDE FILMS

被引：37

作者：

STUART, M

机构：

来源：

PHYSICA STATUS SOLIDI | 1967年 / 23卷 / 02期

关键词：

D O I：

10.1002/pssb.19670230219

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：595 / &

共 6 条

[1] ELECTRICAL CONDUCTION THROUGH SIO FILMS [J].

HARTMAN, TE ;

BLAIR, JC ;

BAUER, R .

[2] NON-OHMIC CONDUCTION IN VACUUM-DEPOSITED SIO FILMS [J].

HIROSE, H ;

WADA, Y .

[3] ELECTRICAL CONDUCTIVITY IN EVAPORATED SILICON OXIDE FILMS [J].

JOHANSEN, IT .

SIMMONS, JG .

PHYSICAL REVIEW, 1967, 155 (03) :657-&

[5]

SIMMONS JH, TO BE PUBLISHED

[6] SILICON VALENCE IN SIO FILMS STUDIED BY X-RAY EMISSION [J].

WHITE, EW ;

ROY, R .