COMPARISON OF AUGER AND SIMS ANALYSIS OF A THIN PASSIVE OXIDE FILM ON IRON 25-PERCENT CHROMIUM

被引：31

作者：

MITCHELL, DF

GRAHAM, MJ

机构：

[1] Natl Research Council of Canada, Ottawa, Can, Natl Research Council of Canada, Ottawa, Can

来源：

SURFACE AND INTERFACE ANALYSIS | 1987年 / 10卷 / 05期

关键词：

IRON CHROMIUM ALLOYS - Thin Films - SPECTROSCOPY; AUGER ELECTRON;

D O I：

10.1002/sia.740100507

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

A comparison of three surface-analytical methods, viz: variable escape angle Auger electron spectroscopy, Auger sputter profiling and SIMS sputter profiling, is presented for a 1. 8 nm-thick 'passive' oxide film on Fe-25% Cr alloy. The three techniques give identical results regarding the composition of the film as a function of depth. This means that with the proper choice of sputtering conditions (heavy ions of low energy), sputter mixing and sputter reduction are not a problem. It is evident from the experimental data that SIMS sputter profiling has the best depth resolution of the three techniques for such a thin film.

引用

页码：259 / 261

页数：3

共 7 条

[1]

DAVIS LE, 1976, HDB AUGER ELECTRON S

[2] A SIMPLE MODEL FOR DEPENDENCE OF AUGER INTENSITIES ON SPECIMEN THICKNESS [J].