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ELECTRON-SENSITIVE RESISTS .2. POSITIVE RESISTS DERIVED FROM HIGH POLYMERS OF METHYL-METHACRYLATE, METHYL ALPHA-CHLOROACRYLATE, AND HEXYL METHACRYLATE
被引:12
作者
:
LAI, JH
论文数:
0
引用数:
0
h-index:
0
LAI, JH
SHRAWAGI, S
论文数:
0
引用数:
0
h-index:
0
SHRAWAGI, S
机构
:
来源
:
JOURNAL OF APPLIED POLYMER SCIENCE
|
1978年
/ 22卷
/ 01期
关键词
:
D O I
:
10.1002/app.1978.070220105
中图分类号
:
O63 [高分子化学(高聚物)];
学科分类号
:
070305 ;
080501 ;
081704 ;
摘要
:
引用
收藏
页码:53 / 58
页数:6
相关论文
共 10 条
[1]
POLY(METHYL METHACRYLATE-ISOBUTYLENE) COPOLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS
GIPSTEIN, E
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
GIPSTEIN, E
MOREAU, W
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
MOREAU, W
NEED, O
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
NEED, O
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(07)
: 1105
-
1109
[2]
HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE
HALLER, I
论文数:
0
引用数:
0
h-index:
0
HALLER, I
HATZAKIS, M
论文数:
0
引用数:
0
h-index:
0
HATZAKIS, M
SRINIVASAN, R
论文数:
0
引用数:
0
h-index:
0
SRINIVASAN, R
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1968,
12
(03)
: 251
-
+
[3]
HATANO Y, 1975, ORGAN COAT PLAST PRE
[4]
INCREASED RADIATION DEGRADATION IN METHYL-METHACRYLATE COPOLYMERS
HELBERT, JN
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
HELBERT, JN
WAGNER, BE
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
WAGNER, BE
CAPLAN, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
CAPLAN, PJ
POINDEXTER, EH
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
POINDEXTER, EH
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1975,
19
(04)
: 1201
-
1203
[5]
INVESTIGATION OF EFFECTS OF MOLECULAR-WEIGHT DISTRIBUTION ON SENSITIVITY OF POSITIVE ELECTRON RESISTS
LAI, JH
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
LAI, JH
SHEPHERD, L
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
SHEPHERD, L
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1976,
20
(09)
: 2367
-
2375
[6]
LAI JH, POLYM ENG SCI
[7]
INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE
LEVINE, AW
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
LEVINE, AW
KAPLAN, M
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
KAPLAN, M
POLINIAK, ES
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
POLINIAK, ES
[J].
POLYMER ENGINEERING AND SCIENCE,
1974,
14
(07)
: 518
-
524
[8]
MCCRUM NG, 1971, ANELASTIC DIELECTRIC, P256
[9]
NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES)
THOMPSON, LF
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,MURRAY HILL,NJ 07974
BELL LABS INC,MURRAY HILL,NJ 07974
THOMPSON, LF
BOWDEN, MJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,MURRAY HILL,NJ 07974
BELL LABS INC,MURRAY HILL,NJ 07974
BOWDEN, MJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(12)
: 1722
-
1726
[10]
THOMPSON LF, 1974, SOLID STATE TECH AUG, P44
←
1
→
共 10 条
[1]
POLY(METHYL METHACRYLATE-ISOBUTYLENE) COPOLYMERS AS HIGHLY SENSITIVE ELECTRON-BEAM RESISTS
GIPSTEIN, E
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
GIPSTEIN, E
MOREAU, W
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
MOREAU, W
NEED, O
论文数:
0
引用数:
0
h-index:
0
机构:
IBM CORP,RES LAB,SAN JOSE,CA 95193
IBM CORP,RES LAB,SAN JOSE,CA 95193
NEED, O
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1976,
123
(07)
: 1105
-
1109
[2]
HIGH-RESOLUTION POSITIVE RESISTS FOR ELECTRON-BEAM EXPOSURE
HALLER, I
论文数:
0
引用数:
0
h-index:
0
HALLER, I
HATZAKIS, M
论文数:
0
引用数:
0
h-index:
0
HATZAKIS, M
SRINIVASAN, R
论文数:
0
引用数:
0
h-index:
0
SRINIVASAN, R
[J].
IBM JOURNAL OF RESEARCH AND DEVELOPMENT,
1968,
12
(03)
: 251
-
+
[3]
HATANO Y, 1975, ORGAN COAT PLAST PRE
[4]
INCREASED RADIATION DEGRADATION IN METHYL-METHACRYLATE COPOLYMERS
HELBERT, JN
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
HELBERT, JN
WAGNER, BE
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
WAGNER, BE
CAPLAN, PJ
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
CAPLAN, PJ
POINDEXTER, EH
论文数:
0
引用数:
0
h-index:
0
机构:
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
USA,ELECTR COMMAND,ELECTR TECHNOL & DEVICES LAB,FT MONMOUTH,NJ 07703
POINDEXTER, EH
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1975,
19
(04)
: 1201
-
1203
[5]
INVESTIGATION OF EFFECTS OF MOLECULAR-WEIGHT DISTRIBUTION ON SENSITIVITY OF POSITIVE ELECTRON RESISTS
LAI, JH
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
LAI, JH
SHEPHERD, L
论文数:
0
引用数:
0
h-index:
0
机构:
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
HONEYWELL INC,RES CTR,BLOOMINGTON,MN 55420
SHEPHERD, L
[J].
JOURNAL OF APPLIED POLYMER SCIENCE,
1976,
20
(09)
: 2367
-
2375
[6]
LAI JH, POLYM ENG SCI
[7]
INTERACTION OF 5 KEV ELECTRONS WITH POLYMERS OF METHYL ISOPROPENYL KETONE
LEVINE, AW
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
LEVINE, AW
KAPLAN, M
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
KAPLAN, M
POLINIAK, ES
论文数:
0
引用数:
0
h-index:
0
机构:
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
RCA CORP,DAVID SARNOFF RES CTR,PRINCETON,NJ 08501
POLINIAK, ES
[J].
POLYMER ENGINEERING AND SCIENCE,
1974,
14
(07)
: 518
-
524
[8]
MCCRUM NG, 1971, ANELASTIC DIELECTRIC, P256
[9]
NEW FAMILY OF POSITIVE ELECTRON-BEAM RESISTS-POLY(OLEFIN SULFONES)
THOMPSON, LF
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,MURRAY HILL,NJ 07974
BELL LABS INC,MURRAY HILL,NJ 07974
THOMPSON, LF
BOWDEN, MJ
论文数:
0
引用数:
0
h-index:
0
机构:
BELL LABS INC,MURRAY HILL,NJ 07974
BELL LABS INC,MURRAY HILL,NJ 07974
BOWDEN, MJ
[J].
JOURNAL OF THE ELECTROCHEMICAL SOCIETY,
1973,
120
(12)
: 1722
-
1726
[10]
THOMPSON LF, 1974, SOLID STATE TECH AUG, P44
←
1
→