INTERDIFFUSION IN THIN CONDUCTOR FILMS - CHROMIUM/GOLD, NICKEL/GOLD AND CHROMIUM SILICIDE/GOLD

被引:46
作者
RAIRDEN, JR
NEUGEBAU.CA
SIGSBEE, RA
机构
来源
METALLURGICAL TRANSACTIONS | 1971年 / 2卷 / 03期
关键词
D O I
10.1007/BF02662726
中图分类号
TF [冶金工业];
学科分类号
0806 ;
摘要
引用
收藏
页码:719 / +
页数:1
相关论文
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