ANODIC FORMATION OF THIN LAYERS OF THALLOUS CHLORIDE ON SOLID THALLIUM

被引：6

作者：

ARMSTRONG, RD

PEARCE, LJ

THIRSK, HR

机构：

[1] Department of Physical Chemistry, University of Newcastle upon Tyne, Newcastle upon Tyne

来源：

ELECTROCHIMICA ACTA | 1969年 / 14卷 / 10期

关键词：

D O I：

10.1016/0013-4686(69)85030-9

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

The mechanism of the formation of TlCl on solid Tl is shown to be similar to that on 40 at-% Tl amalgam. In both cases the initial reaction is the growth of a monomolecular layer of the new phase by the nucleation and expansion of two-dimensional centres. The significance of these observations is discussed. © 1969.

引用

页码：949 / +

页数：1

共 9 条

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