OPTICAL AND X-RAY INTERFEROMETRY OF A SILICON LATTICE SPACING

被引：37

作者：

DESLATTES, RD

机构：

[1] National Bureau of Standards, Washington

来源：

APPLIED PHYSICS LETTERS | 1969年 / 15卷 / 11期

关键词：

D O I：

10.1063/1.1652870

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A device permitting simultaneous x-ray and optical interferometry over traverses in excess of 20 μm is reported. Results obtained to date suggest that such devices will permit measurements of certain crystal-lattice spacings with accuracies better than one part per million. © 1969 The American Institute of Physics.

引用

页码：386 / +

页数：1

共 11 条

[1]

BARUS C, 1911, 149 CARN I WASH PU 1

[2]

BARUS C, 1922, 149 CARN I WASH PU 2

[3] AN X-RAY INTERFEROMETER WITH LONG SEPARATED INTERFERING BEAM PATHS (E) [J].