PREPARATION OF LANTHANIDE, THORIUM AND URANIUM OXIDE-FILMS BY CHEMICAL VAPOR-DEPOSITION USING BETA-DIKETONE CHELATES

被引：30

作者：

SHIOKAWA, Y ^{[1
]}

AMANO, R ^{[1
]}

NOMURA, A ^{[1
]}

YAGI, M ^{[1
]}

机构：

[1] KANAZAWA UNIV,SCH ALLIED MED PROFESS,KANAZAWA,ISHIKAWA 920,JAPAN

来源：

JOURNAL OF RADIOANALYTICAL AND NUCLEAR CHEMISTRY-ARTICLES | 1991年 / 152卷 / 02期

关键词：

D O I：

10.1007/BF02104690

中图分类号：

O65 [分析化学];

学科分类号：

070302 ; 081704 ;

摘要：

Preparation of thin film deposits of lanthanide, thorium and uranium oxides has been studied by chemical vapor deposition (CVD) method using beta-diketonate metal chelates with 2,2,6,6-tetramethyl-3,5-heptanedione and some reactant gases as starting materials. The deposition process was carried out using a special apparatus designed for the CVD method at atmospheric pressure and temperatures as low as 400-600-degrees-C. As a result, it was demonstrated that each chelate used was well suited for the above purpose by its high volatility and reactivity with the reactant, especially with water vapor.

引用

页码：373 / 380

页数：8

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