WATER ELECTRET RELAXATION AT DISPERSED SILICA SURFACES

被引：9

作者：

TISCHENKO, VA ^{[1
]}

GUNKO, VM ^{[1
]}

机构：

[1] INST SURFACE CHEM, KIEV 252022, UKRAINE

来源：

COLLOIDS AND SURFACES A-PHYSICOCHEMICAL AND ENGINEERING ASPECTS | 1995年 / 101卷 / 2-3期

关键词：

QUANTUM CHEMICAL SIMULATION; RELAXATION PROCESS; SILICA; THERMALLY STIMULATED DEPOLARIZATION;

D O I：

10.1016/0927-7757(95)03189-K

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The behavior of water adsorbed at highly dispersed silica surfaces at low temperatures has been studied by thermally stimulated depolarization (TSD) and quantum chemical methods. Three relaxation maxima of the TSD spectra are observed without high-temperature treatment of the samples, and are interpreted as connected with uni-, bi- and tridimensional water clusters. Dynamic simulation of different relaxation processes of water molecules, which bind to silica surfaces directly or through hydrogen bonds with other adsorbed molecules, shows that the relaxation time decreases as the water cluster grows. The activation energy of rotation is a maximum for molecules with donor-acceptor bonds Si <-- OH2 in the complexes GRAPHICS

引用

页码：287 / 294

页数：8

共 23 条

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[2]

BELFORT G, 1984, WATER POLYMERS

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