A new class of high-temperature-resistant block copolymer materials based on poly(dimethylsiloxane) (PDMS) and aromatic polyamides (aramids) was developed. PDMS-aramid multiblock copolymers of wide ranging compositions were successfully synthesized by low-temperature solution poly-condensation through two different procedures. In the two-step method, α,ω-diacid chloride terminated aramid oligomers, which were preformed by the reaction of 3-(4-aminophenoxy)aniline (3,4′-ODA) with isophthaloyl chloride (IPC) in chloroform, were subjected to polycondensation with α,ω-bis(3-aminopropyl)poly(dimethylsiloxane) (PDMS-diamine) in the same flask, leading to the formation of the 3,4′-ODA series multiblock copolymers. In the one-step method, three reaction components, 3,4′-ODA, IPC, and PDMS-diamine, were reacted all together in chloroform.