MATCHING THE RESISTIVITY OF SI-NB THIN-FILM THERMOMETERS TO THE EXPERIMENTAL TEMPERATURE-RANGE

被引：3

作者：

DEVECCHIO, D

TABOREK, P

RUTLEDGE, JE

机构：

来源：

REVIEW OF SCIENTIFIC INSTRUMENTS | 1995年 / 66卷 / 11期

关键词：

D O I：

10.1063/1.1146114

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

The useful temperature range of semiconducting resistive thermometers is limited by declining sensitivity at high temperature and inconveniently high resistivity at low temperatures. The useful temperature range of sputtered thin film Si:Nb resistance thermometers is controlled by the Nb concentration. We have developed a simple technique for controlling the Nb concentration during the fabrication process. We describe an extremely sensitive family of thermometers with useful temperature ranges that overlap and span temperatures from below 1 K to above 450 K. (C) 1995 American Institute of Physics.

引用

页码：5367 / 5368

页数：2

共 13 条

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