USE OF A PATTERNED SELF-ASSEMBLED MONOLAYER TO CONTROL THE FORMATION OF A LIQUID RESIST PATTERN ON A GOLD SURFACE

被引：40

作者：

GORMAN, CB ^{[1
]}

BIEBUYCK, HA ^{[1
]}

WHITESIDES, GM ^{[1
]}

机构：

[1] HARVARD UNIV,DEPT CHEM,CAMBRIDGE,MA 02138

来源：

CHEMISTRY OF MATERIALS | 1995年 / 7卷 / 02期

关键词：

D O I：

10.1021/cm00050a003

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Patterned self-assembled monolayers of hexadecanethiol and beta-mercaptoethanol on gold can be used to trap and hold a thin film of liquid resist on the surface. This resist pattern was used to protect certain regions of the gold from etching by aqua regia and to shield these regions against electroless deposition of copper. The liquid resist pattern could then be removed by washing with organic solvent.

引用

页码：252 / 254

页数：3

共 29 条

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