STRAIN DEPENDENCE OF RESISTIVITY OF SILVER FILMS

被引：43

作者：

VERMA, BS

JURETSCHKE, HJ

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1970年 / 41卷 / 11期

关键词：

D O I：

10.1063/1.1658523

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：4732 / +

页数：1

共 11 条

[1]

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JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) :1699-&

[3]

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PHYSICA, 1951, 17 (07) :748-760

[5]

DUGGAL VP, 1968, J APPL PHYS, V13, P206

[6] EFFECT OF EXPANSION MISMATCH ON TEMPERATURE COEFFICIENT OF RESISTANCE OF THIN FILMS [J].

HALL, PM .

APPLIED PHYSICS LETTERS, 1968, 12 (06) :212-&

[7] ELECTRICAL-RESISTIVITY MODEL FOR POLYCRYSTALLINE FILMS - CASE OF ARBITRARY REFLECTION AT EXTERNAL SURFACES [J].

MAYADAS, AF ;

SHATZKES, M .

PHYSICAL REVIEW B, 1970, 1 (04) :1382-&

[8] A THEORETICAL STUDY OF EFFECT OF ELASTIC STRAIN ON ELECTRICAL RESISTANCE OF THIN METAL FILMS [J].

MEIKSIN, ZH ;

HUDZINSKI, RA .

JOURNAL OF APPLIED PHYSICS, 1967, 38 (11) :4490-+

[9] STRESS ANNEALING IN VACUUM DEPOSITED COPPER FILMS [J].

STORY, HS ;

HOFFMAN, RW .

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[10]

VERMA BS, 1969, THESIS POLYTECHNIC I

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