A THEORETICAL-STUDY OF THE ELECTRONIC-STRUCTURE OF DISILOXANE [(SIH3)2O] AND ITS RELATION TO SILICATES

被引：34

作者：

MEIER, R ^{[1
]}

HA, TK ^{[1
]}

机构：

[1] SWISS FED INST TECHNOL,PHYS CHEM LAB,CH-8000 ZURICH,SWITZERLAND

来源：

关键词：

D O I：

10.1007/BF00308392

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：37 / 46

页数：10

共 31 条

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