ELECTRON-BEAM SENSITIVITY IN INORGANIC SPECIMENS

被引：48

作者：

HOBBS, LW

机构：

[1] MIT, Cambridge, MA, USA, MIT, Cambridge, MA, USA

来源：

ULTRAMICROSCOPY | 1987年 / 23卷 / 3-4期

关键词：

The author is grateful to the Arizona State University winter workshop organizers for the opportunity to review this field and to the US Department of Energy for financial support under grant DE-FG02-84ER45090;

D O I：

10.1016/0304-3991(87)90244-0

中图分类号：

TH742 [显微镜];

学科分类号：

摘要：

引用

页码：339 / 344

页数：6

共 13 条

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[2]

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[3]

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[4]

Hobbs L.W., 1980, J PHYSIQUE C, V41, DOI DOI 10.1051/JPHYSCOL:1980660

[5]

Hobbs L.W., 1985, EMSA B, V15, P51

[6]

Hobbs L. W., 1980, ANALYTIC ELECT MICRO, P437, DOI 10.1007/978-1-4757-5581-7_17

[7]

HOBBS LW, 1984, QUANTITATIVE ELECTRO, P399

[8]

HOBBS LW, 1983, 41ST P ANN EMSA M PH, P346

[9] VACANCY-INTERSTITIAL PAIR PRODUCTION VIA ELECTRON-HOLE RECOMBINATION IN HALIDE CRYSTALS [J].

KABLER, MN ;

WILLIAMS, RT .

PHYSICAL REVIEW B, 1978, 18 (04) :1948-1960

[10]

MAKIN MJ, 1978, ELECTRON MICROSCOPY, V3, P330

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