CONTINUOUS OBSERVATION OF INITIAL GROWTH AND COALESCENCE OF BISMUTH DEPOSITS BY IN SITU ELECTRON MICROSCOPY

被引：4

作者：

INUZUKA, T

UEDA, R

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1969年 / 6卷 / 03期

关键词：

D O I：

10.1116/1.1492697

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：379 / &

共 22 条

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