RESISTIVITY AND STRUCTURE OF EVAPORATED ALUMINUM FILMS

[1] BRATSBERG H, PRIVATE COMMUNICATIO

[2] CAMPBELL DS, 1966, USE THIN FILMS PHYSI, P315

[3] FEDER R, TO BE PUBLISHED

[4] The conductivity of thin metallic films according to the electron theory of metals [J]. PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 : 100 - 108

[5] SPATIAL VARIATION OF CURRENTS AND FIELDS DUE TO LOCALIZED SCATTERERS IN METALLIC CONDUCTION [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1957, 1 (03) : 223 - 231

[6] RESISTIVITY OF RF SPUTTER-THINNED ALUMINUM FILMS [J]. APPLIED PHYSICS LETTERS, 1969, 14 (02) : 74 - &

[7] INTRINSIC RESISTIVITY AND ELECTRON MEAN FREE PATH IN ALUMINUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (09) : 4241 - &

[8] MEASUREMENT OF SHEET RESISTIVITIES WITH THE 4-POINT PROBE [J]. BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (03): : 711 - 718

[9] THE MEAN FREE PATH OF ELECTRONS IN METALS [J]. ADVANCES IN PHYSICS, 1952, 1 (01) : 1 - 42

[1] BRATSBERG H, PRIVATE COMMUNICATIO

[2] CAMPBELL DS, 1966, USE THIN FILMS PHYSI, P315

[3] FEDER R, TO BE PUBLISHED

[4] The conductivity of thin metallic films according to the electron theory of metals [J]. PROCEEDINGS OF THE CAMBRIDGE PHILOSOPHICAL SOCIETY, 1938, 34 : 100 - 108

[5] SPATIAL VARIATION OF CURRENTS AND FIELDS DUE TO LOCALIZED SCATTERERS IN METALLIC CONDUCTION [J]. IBM JOURNAL OF RESEARCH AND DEVELOPMENT, 1957, 1 (03) : 223 - 231

[6] RESISTIVITY OF RF SPUTTER-THINNED ALUMINUM FILMS [J]. APPLIED PHYSICS LETTERS, 1969, 14 (02) : 74 - &

[7] INTRINSIC RESISTIVITY AND ELECTRON MEAN FREE PATH IN ALUMINUM FILMS [J]. JOURNAL OF APPLIED PHYSICS, 1968, 39 (09) : 4241 - &

[8] MEASUREMENT OF SHEET RESISTIVITIES WITH THE 4-POINT PROBE [J]. BELL SYSTEM TECHNICAL JOURNAL, 1958, 37 (03): : 711 - 718

[9] THE MEAN FREE PATH OF ELECTRONS IN METALS [J]. ADVANCES IN PHYSICS, 1952, 1 (01) : 1 - 42