TRACKING ANION EXPULSION DURING UNDERPOTENTIAL DEPOSITION OF LEAD AT SILVER USING THE QUARTZ MICROBALANCE

被引：32

作者：

HEPEL, M ^{[1
]}

BRUCKENSTEIN, S ^{[1
]}

机构：

[1] SUNY BUFFALO, DEPT CHEM, BUFFALO, NY 14214 USA

来源：

ELECTROCHIMICA ACTA | 1989年 / 34卷 / 11期

关键词：

D O I：

10.1016/0013-4686(89)87032-X

中图分类号：

O646 [电化学、电解、磁化学];

学科分类号：

081704 ;

摘要：

引用

页码：1499 / 1504

页数：6

共 18 条

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[6] UNDERPOTENTIAL METAL-DEPOSITION ON GOLD, MONITORED INSITU WITH A QUARTZ MICROBALANCE [J].

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[7] CRYSTAL GROWTH AT THE CATHODE [J].

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[9]

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[10]

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