ENERGY EFFECTS IN SECONDARY ION EMISSION OF IMPLANTED AND SIMULTANEOUSLY SPUTTERED ARGON

被引：10

作者：

KOSYACHKOV, AA

CHEREPIN, VT

机构：

来源：

SOLID STATE COMMUNICATIONS | 1989年 / 69卷 / 06期

关键词：

D O I：

10.1016/0038-1098(89)90056-2

中图分类号：

O469 [凝聚态物理学];

学科分类号：

070205 ;

摘要：

引用

页码：659 / 661

页数：3

共 9 条

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[8] ANOMALOUS TIME-OF-FLIGHT DISTRIBUTIONS OBSERVED FOR ARGON IMPLANTED IN SILICON AND RESPUTTERED BY AR+-ION BOMBARDMENT [J].

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