THERMAL DIFFUSE X-RAY-SCATTERING STUDIES OF THE WATER-VAPOR INTERFACE

被引：192

作者：

SCHWARTZ, DK

SCHLOSSMAN, ML

KAWAMOTO, EH

KELLOGG, GJ

PERSHAN, PS

OCKO, BM

机构：

[1] HARVARD UNIV, DEPT APPL SCI, CAMBRIDGE, MA 02138 USA

[2] BROOKHAVEN NATL LAB, DEPT PHYS, UPTON, NY 11973 USA

来源：

PHYSICAL REVIEW A | 1990年 / 41卷 / 10期

关键词：

D O I：

10.1103/PhysRevA.41.5687

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

Agreement between the theoretical and measured resolution dependence of x-ray specular reflection from the H2O-vapor interface shows that the macroscopic capillary model for surface roughness can be extended to length scales as small as 400. Agreement between measured thermal diffuse scattering data and the theoretical form, with no significant adjustable parameters, independently leads to similar conclusions. © 1990 The American Physical Society.

引用

页码：5687 / 5690

页数：4

共 14 条

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