XPS STUDY OF CHEMISORPTION OF CH4 ON NI(100)

被引：97

作者：

CHORKENDORFF, I ^{[1
]}

ALSTRUP, I ^{[1
]}

ULLMANN, S ^{[1
]}

机构：

[1] HALDOR TOPSOE RES LABS,DK-2800 LYNGBY,DENMARK

来源：

SURFACE SCIENCE | 1990年 / 227卷 / 03期

关键词：

D O I：

10.1016/S0039-6028(05)80017-2

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The sticking coefficient of CH4 on Ni(100) has been determined as a function of coverage in the temperature range 400-550 K using XPS to monitor surface concentrations. The sticking curves are well described by an expression derived for random, direct chemisorption on sites with free neighbor sites. The apparent activation energy of the initial sticking coefficient is determined as 52 kJ/mol. © 1990 Elsevier Science Publishers B.V. (North-Holland).

引用

页码：291 / 296

页数：6

共 11 条

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