ADSORPTION OF METHANOL ON THE LOW TI-+3 POINT-DEFECTS OF THE TIO2(001) SURFACE AT 300-K

被引：17

作者：

ROMAN, E

BUSTILLO, FJ

DESEGOVIA, JL

机构：

[1] Laboratorio de Fisica de Superficies, Instituto de Ciencia de Materiales, CSIC, 28006 Madrid

来源：

VACUUM | 1990年 / 41卷 / 1-3期

关键词：

D O I：

10.1016/0042-207X(90)90265-Z

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The adsorption of methanol on the low Ti+3 point defects of the TiO2(001) surface has been studied by using uv photoelectron spectroscopy (UPS) and thermal desorption spectrometry (TDS) techniques. Exposure of the surface to 10 L of methanol at 300 K results in dissociative adsorption into methoxy radicals as revealed by the UPS structure at -9.8 and -5.2 eV energy. The dissociation energy, Ed of the methoxy species is coverage dependent and ranges from ∼ 106 to 197 kJ mol-1. The main thermally desorbed products are H2, CO and CH3OH with maximum rates at temperatures of 390, 375 and 352 K respectively. Minor quantities of CH4, CH2O and H2O are also detected. © 1990 Pergamon Press plc.

引用

页码：40 / 42

页数：3

共 13 条

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[2]

[Anonymous], 1962, VACUUM

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