GLOBAL PLANARIZATION OF SPUN-ON THIN-FILMS BY REFLOW

被引：12

作者：

BORNSIDE, DE ^{[1
]}

BROWN, RA ^{[1
]}

MITTAL, S ^{[1
]}

GEYLING, FT ^{[1
]}

机构：

[1] SEMATECH,AUSTIN,TX 78741

来源：

APPLIED PHYSICS LETTERS | 1991年 / 58卷 / 11期

关键词：

D O I：

10.1063/1.104358

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The leveling of a thin-liquid film on a substrate having a mesa-like feature is analyzed by finite element analysis and lubrication theory applied to the free-surface viscous flow problem. The height of the mesa is on the order of 1-mu-m and has a width on the order of 100-mu-m; the thin-liquid film is initially conformal to the substrate and has a thickness on the order of 1-mu-m. Capillarity is found to be the primary driving force for flow. The predicted leveling times from the numerical simulations compare favorably with an analytical solution developed from lubrication theory for the leveling of a thin film on a smooth substrate.

引用

页码：1181 / 1183

页数：3