THIN-FILMS FOR FERROELECTRIC DEVICES

被引：10

作者：

BRUCHHAUS, R

机构：

[1] SIEMENS AG, Corporate Research and Development, Dept. ZFE BT MR 21, W-8000, München 83

来源：

FERROELECTRICS | 1992年 / 133卷 / 1-4期

关键词：

D O I：

10.1080/00150199208217978

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The article reviews the materials and deposition methods for ferroelectric thin films. The electrical results of PZT films deposited with six different deposition methods combined with two different routes to process the films are compared. Planar multi target sputtering of PZT and lead titanate is discussed in more detail.

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收藏

页码：73 / 78

页数：6

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