A SUBMICROMETER NB/ALOX/NB JOSEPHSON JUNCTION

被引：48

作者：

IMAMURA, T

HASUO, S

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1988年 / 64卷 / 03期

关键词：

D O I：

10.1063/1.341792

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1586 / 1588

页数：3

共 11 条

[1] JOSEPHSON 8-BIT SHIFT REGISTER [J].

FUJIMAKI, N ;

KOTANI, S ;

IMAMURA, T ;

HASUO, S .

IEEE JOURNAL OF SOLID-STATE CIRCUITS, 1987, 22 (05) :886-891

[2]

FUJIMAKI N, IN PRESS IEEE J SOLI

[3] HIGH-QUALITY REFRACTORY JOSEPHSON TUNNEL-JUNCTIONS UTILIZING THIN ALUMINUM LAYERS [J].

GURVITCH, M ;

WASHINGTON, MA ;

HUGGINS, HA .

APPLIED PHYSICS LETTERS, 1983, 42 (05) :472-474

[4]

HOKO H, 1986, INT C SOLID STATE DE, P447

[5]

IMAMURA T, UNPUB

[6]

Kotani S., 1986, International Electron Devices Meeting 1986. Technical Digest (Cat. No.86CH2381-2), P93

[7]

KOTANI S, 1987, ISSCC, P60

[8] SELECTIVE NIOBIUM ANODIZATION PROCESS FOR FABRICATING JOSEPHSON TUNNEL-JUNCTIONS [J].

KROGER, H ;

SMITH, LN ;

JILLIE, DW .

APPLIED PHYSICS LETTERS, 1981, 39 (03) :280-282

[9] HIGH-QUALITY NB/AL-ALOX/NB JOSEPHSON JUNCTION [J].

MOROHASHI, S ;

SHINOKI, F ;

SHOJI, A ;

AOYAGI, M ;

HAYAKAWA, H .

APPLIED PHYSICS LETTERS, 1985, 46 (12) :1179-1181

[10]

SMITH LN, 1983, IEEE T MAGN, V19, P787, DOI 10.1109/TMAG.1983.1062308

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