CHEMICAL VAPOR-DEPOSITION OF NICKEL PHOSPHIDE NI2P

被引：22

作者：

MOTOJIMA, S

HAGURI, K

TAKAHASHI, Y

SUGIYAMA, K

机构：

[1] Department of Synthetic Chemistry, Faculty of Engineering, Gifu University, Kakamigahara, Gifu

来源：

JOURNAL OF THE LESS-COMMON METALS | 1979年 / 64卷 / 01期

关键词：

D O I：

10.1016/0022-5088(79)90137-1

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Dinickel phosphide Ni2P was deposited from a gas mixture of NiCl2, PC13, H2 and Ar. A maximum deposition rate was obtained at 950 - 1000 °C and PCl3/NiCl3 - 1.1. The atomic ratio P/Ni in deposits increased with increasing PCl3/NiCl2 ratio in the input gas and attained a constant value (rP/Ni= 0.53) at gas ratios above 1.0. The average microhardness increased with increasing PCl3/NiCl2 ratio and attained a constant value (about 1000 kg mm-2) above a ratio of unity. Molybdenum plate coated with Ni-P compounds under various conditions was more resistant than nickel plate or electroless nickel-plated iron. © 1979.

引用

页码：101 / 106

页数：6