THE DEPENDENCE OF THE ELECTRICAL-PROPERTIES OF ION-BEAM SPUTTERED INDIUM TIN OXIDE ON ITS COMPOSITION AND STRUCTURE

被引：22

作者：

GESSERT, TA ^{[1
]}

WILLIAMSON, DL ^{[1
]}

COUTTS, TJ ^{[1
]}

NELSON, AJ ^{[1
]}

JONES, KM ^{[1
]}

DHERE, RG ^{[1
]}

AHARONI, H ^{[1
]}

ZURCHER, P ^{[1
]}

机构：

[1] COLORADO SCH MINES,GOLDEN,CO 80401

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1987年 / 5卷 / 04期

关键词：

D O I：

10.1116/1.574756

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

引用

页码：1314 / 1315

页数：2

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[4]

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[5]

Drude P, 1900, PHYS Z, V1, P161

[6]

ENGINSOY C, 1950, PHYS REV, V79, P1013

[7]

Vossen J. L., 1977, PHYS THIN FILMS, V9, P1

[8] MOSSBAUER-SPECTROSCOPY OF AMORPHOUS-SILICON TIN HYDROGEN ALLOYS [J].

WILLIAMSON, DL ;

DEB, SK .

JOURNAL OF APPLIED PHYSICS, 1983, 54 (05) :2588-2592

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