AMORPHIZATION FROM THE QUENCHED HIGH-PRESSURE PHASE OF SILICON AND GERMANIUM

被引:22
作者
IMAI, M [1 ]
YAOITA, K [1 ]
KATAYAMA, Y [1 ]
CHEN, JQ [1 ]
TSUJI, K [1 ]
机构
[1] KEIO UNIV,FAC SCI & TECHNOL,DEPT PHYS,YOKOHAMA,KANAGAWA 223,JAPAN
关键词
D O I
10.1016/0022-3093(92)90093-Y
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The phase transitions from the quenched high-pressure phase, including amorphous state, have been investigated for crystalline silicon and germanium at various pressures. X-ray diffraction patterns have been measured at pressures up to 15 GPa and temperatures down to 90 K by an energy-dispersive method using synchrotron radiation and a diamond anvil cell. The quenched beta-Sn phase undergoes an amorphous phase transition when heated at 1.5 GPa for c-Si and 2.0 GPa for c-Ge. On the other hand, the quenched beta-Sn phase transforms into a metastable crystalline phase when heated at higher pressures. The phase behavior is discussed in relation to the pressure dependence of the height of potential barrier between the beta-Sn and amorphous phases and that between the beta-Sn and metastable crystalline phases. The coordination number for the pressure-induced amorphous germanium, obtained through amorphization, from the quenched high-pressure phase, is estimated to be about 4.
引用
收藏
页码:49 / 52
页数:4
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