PHOTOCHEMICAL STUDIES ON THE TERTIARY BUTYL RADICAL ISOLATED IN ARGON MATRICES

被引:15
作者
PACANSKY, J
CHANG, JS
BROWN, DW
机构
关键词
D O I
10.1016/0040-4020(82)80004-5
中图分类号
O62 [有机化学];
学科分类号
070303 ; 081704 ;
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页码:257 / 260
页数:4
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