OXIDIZED AMORPHOUS-SILICON SUPERCONDUCTING TUNNEL JUNCTION BARRIERS

被引：63

作者：

RUDMAN, DA

BEASLEY, MR

机构：

[1] STANFORD UNIV,DEPT APPL PHYS,STANFORD,CA 94305

[2] STANFORD UNIV,DEPT ELECTR ENGN,STANFORD,CA 94305

来源：

APPLIED PHYSICS LETTERS | 1980年 / 36卷 / 12期

关键词：

D O I：

10.1063/1.91666

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：1010 / 1013

页数：4

相关论文

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