FABRICATION OF Y-BA-CU-O SUPERCONDUCTING FILMS ON CU SUBSTRATES BY AN ELECTROPHORETIC DEPOSITION TECHNIQUE

被引：18

作者：

NOJIMA, H

NAGATA, M

SHINTAKU, H

KOBA, M

机构：

[1] Corporate R and D Group, SHARP CORPORATION, Ichinomoto-cho, Tenri, Nara

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1990年 / 29卷 / 09期

关键词：

Cu substrate; Electrophoretic deposition; High T[!sub]c[!/sub] oxide superconductor; Interfacial; Reaction; Y[!sub]1[!/sub]Ba[!sub]2[!/sub]Cu[!sub]3[!/sub]O[!sub]7-x[!/sub;

D O I：

10.1143/JJAP.29.L1655

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Direct formation of Y1Ba2Cu3O7-x films on Cu substrates by electrophoretic deposition is studied, Electrophoretic deposition was carried out using presintered Y1Ba2Cu3O7-x powder dispersed in distilled acetone. The deposited films were annealed in air at 900°C. We succeeded in obtaining superconducting Y1Ba2Cu3O7-x films on Cu substrates. The films on Cu plates and Cu film/YSZ exhibited the zero-resistance state at 66 K and 76 K, respectively. Interfacial chemical reactions at the Y1Ba2Cu3O7-x/Cu interface are discussed. The achievement of the zero-resistance state is considered to be due to the reduction of the interfacial reactions. © 1990 The Japan Society of Applied Physics.

引用

页码：L1655 / L1658

页数：4

共 7 条

[1] HIGH-TC SCREEN-PRINTED YBA2CU3O7-X FILMS - EFFECT OF THE SUBSTRATE MATERIAL [J].