PHOTOSENSITIVITY OF POLYVINYLESTERS OF SUBSTITUTED CINNAMYLIDENEACETIC ACIDS

被引：27

作者：

TANAKA, H ^{[1
]}

SATO, Y ^{[1
]}

机构：

[1] NATL CHEM LAB IND,HIRATSUKASHI,KANAGAWA 254,JAPAN

来源：

关键词：

D O I：

10.1002/pol.1972.170101114

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

引用

页码：3279 / 3287

页数：9

共 11 条

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[5]

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TSUDA, M ;

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