KINETIC-STUDY OF METALLIC SILVER PHOTOINDUCED SURFACE DEPOSITION PHENOMENON

被引:6
作者
KAWAGUCHI, T
MARUNO, S
机构
[1] Department of Electrical and Computer Engineering, Nagoya Institute of Technology, Showa-ku, Nagoya
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1994年 / 33卷 / 6A期
关键词
CHALCOGENIDE GLASS; PHOTOINDUCED SURFACE DEPOSITION PHENOMENON; PHOTODEPOSITION PHENOMENON; KINETIC STUDY;
D O I
10.1143/JJAP.33.3417
中图分类号
O59 [应用物理学];
学科分类号
摘要
The kinetics of photoinduced surface deposition (PSD) of metallic silver have been studied through observation of growth of the photodeposited Ag particles. The amount of metallic Ag segregated by PSD increases in proportion to exposure time at the early stage and subsequently to the square root of exposure time. The kinetics can be explained by the change in the rate-determining step from the photoelectronic process to diffusion process of Ag+ ions in glass.
引用
收藏
页码:3417 / 3418
页数:2
相关论文
共 4 条
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KAWAGUCHI T, 1993, J NONCRYST SOLIDS, V164, P1231
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