EFFECTS OF ARGON PRESSURE AND SUBSTRATE-TEMPERATURE ON THE STRUCTURE AND PROPERTIES OF SPUTTERED COPPER-FILMS

被引：101

作者：

CRAIG, S

HARDING, GL

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY | 1981年 / 19卷 / 02期

关键词：

Compendex;

D O I：

10.1116/1.571105

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

COPPER AND ALLOYS

引用

页码：205 / 215

页数：11

共 29 条

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