OXYGEN-OXYGEN COMPLEXES AND THERMAL DONORS IN SILICON

被引:27
作者
CHADI, DJ
机构
[1] Xerox Corporation, Palo Alto Research Center, Palo Alto, CA 94304
来源
PHYSICAL REVIEW B | 1990年 / 41卷 / 15期
关键词
D O I
10.1103/PhysRevB.41.10595
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The suitability of several vacancy-oxygen and interstitial oxygen complexes as cores of thermal donors in silicon is examined. Tight-binding-based total-energy-minimization calculations were used in the determination of the atomic structure of the complexes. Vacancy-O2 and interstitial O-O complexes are found to exhibit bistability and are the simplest structures exhibiting double-donor behavior. Atomic relaxations leading to oxygen-oxygen bonding and a threefold coordination of the oxygen atoms are critical in producing the double-donor activity. © 1990 The American Physical Society.
引用
收藏
页码:10595 / 10603
页数:9
相关论文
共 63 条
[1]  
[Anonymous], 1979, MOL SPECTRA MOL STRU
[2]   THEORY OF THE SILICON VACANCY - AN ANDERSON NEGATIVE-U SYSTEM [J].
BARAFF, GA ;
KANE, EO ;
SCHLUTER, M .
PHYSICAL REVIEW B, 1980, 21 (12) :5662-5686
[3]   SIMPLE PARAMETRIZED MODEL FOR JAHN-TELLER SYSTEMS - VACANCY IN P-TYPE SILICON [J].
BARAFF, GA ;
KANE, EO ;
SCHLUTER, M .
PHYSICAL REVIEW B, 1980, 21 (08) :3563-3570
[4]  
BARAFF GA, 1979, PHYS REV LETT, V37, P1504
[5]   SILICON ELECTRON-NUCLEAR DOUBLE-RESONANCE STUDY OF THE NL10 HEAT-TREATMENT CENTER [J].
BEKMAN, HHPT ;
GREGORKIEWICZ, T ;
AMMERLAAN, CAJ .
PHYSICAL REVIEW B, 1989, 39 (03) :1648-1658
[6]  
Benton J. L., 1985, Thirteenth International Conference on Defects in Semiconductors, P647
[7]  
BORENSTEIN JT, 1985, MATERIALS RES SOC S, V59, P173
[8]  
Bourret A., 1985, Thirteenth International Conference on Defects in Semiconductors, P129
[9]   (110) SURFACE ATOMIC STRUCTURES OF COVALENT AND IONIC SEMICONDUCTORS [J].
CHADI, DJ .
PHYSICAL REVIEW B, 1979, 19 (04) :2074-2082
[10]   ENERGY-MINIMIZATION APPROACH TO ATOMIC GEOMETRY OF SEMICONDUCTOR SURFACES [J].
CHADI, DJ .
PHYSICAL REVIEW LETTERS, 1978, 41 (15) :1062-1065