TEM INVESTIGATION OF CVD GRAPHITE ON NICKEL

被引：30

作者：

JOHANSSON, AS

LU, J

CARLSSON, JO

机构：

[1] Uppsala University, Institute of Chemistry, Thin Film and Surface Chemistry group, S-751 21 Uppsala

来源：

THIN SOLID FILMS | 1994年 / 252卷 / 01期

关键词：

CHEMICAL VAPOR DEPOSITION; GRAPHITE; NICKEL; TRANSMISSION ELECTRON MICROSCOPY;

D O I：

10.1016/0040-6090(94)90819-2

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Graphite films have been deposited by chemical vapour deposition from C2H4 at 1170 K on polycrystalline Ni substrates. The graphite films were characterized with respect to surface morphology and microstructure. The interface between the deposited graphite and the Ni grains was investigated by transmission electron microscopy. A smooth interface between the graphite and the Ni was observed. Electron diffraction was used to determine orientation relationships between the graphite and the Ni grains. Four different Ni grain orientations were found and for all four the graphite layers grow parallel to the Ni grain surface. A nucleation and growth mechanism involving hydrogen abstraction reactions and formation of polycyclic hydrocarbons has been proposed.

引用

页码：19 / 25

页数：7

共 23 条

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