LASER PHOTOLYSIS AND CIDEP STUDIES OF THE FORMATION OF PHENYL-SUBSTITUTED GROUP 4B ELEMENT (SILICON, GERMANIUM, AND TIN)-CENTERED RADICALS IN DIRECT PHOTOEJECTION OF THE GROUP 4B ELEMENT-CENTERED ANIONS

被引：25

作者：

MOCHIDA, K ^{[1
]}

WAKASA, M ^{[1
]}

SAKAGUCHI, Y ^{[1
]}

HAYASHI, H ^{[1
]}

机构：

[1] INST PHYS & CHEM RES,WAKO,SAITAMA 35101,JAPAN

来源：

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY | 1987年 / 109卷 / 26期

关键词：

D O I：

10.1021/ja00260a002

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：7942 / 7947

页数：6

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